Invention Grant
US09305814B2 Method of inspecting substrate processing apparatus and storage medium storing inspection program for executing the method
有权
检查基板处理装置的方法和存储用于执行该方法的检查程序的存储介质
- Patent Title: Method of inspecting substrate processing apparatus and storage medium storing inspection program for executing the method
- Patent Title (中): 检查基板处理装置的方法和存储用于执行该方法的检查程序的存储介质
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Application No.: US11311549Application Date: 2005-12-20
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Publication No.: US09305814B2Publication Date: 2016-04-05
- Inventor: Masahiro Numakura
- Applicant: Masahiro Numakura
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-368282 20041220
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/677

Abstract:
A method of inspecting a substrate processing apparatus, which is capable of preventing product substrates from being supplied to a substrate processing chamber to be inspected, and inspecting the substrate processing chamber in desired timing. Product wafers W (product substrates) are inhibited from being conveyed into a processing unit to be inspected (substrate processing chamber) according to a selection of a menu option “QC MODE” by an operator, or in response to instruction from a host computer. A QC wafer is permitted to be conveyed from a carrier connected to an associated load port 24 into the processing unit to be inspected, in response to a notification the fact that a wafer stored in the carrier connected to the associated load port 24 is the QC wafer.
Public/Granted literature
Information query
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