Invention Grant
- Patent Title: Silicon carbide semiconductor device
- Patent Title (中): 碳化硅半导体器件
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Application No.: US14803435Application Date: 2015-07-20
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Publication No.: US09306006B2Publication Date: 2016-04-05
- Inventor: Kosuke Uchida , Toru Hiyoshi
- Applicant: Sumitomo Electric Industries, Ltd.
- Applicant Address: JP Osaka-shi
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka-shi
- Agency: Venable LLP
- Agent Michael A. Sartori
- Priority: JP2014-151003 20140724; JP2015-107340 20150527
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L29/04 ; H01L29/78 ; H01L29/423

Abstract:
There is provided a silicon carbide semiconductor device allowing for suppression of breakage of an element upon short circuit of load. A MOSFET includes a silicon carbide layer, a gate insulating film, a gate electrode, a source electrode, and a drain electrode. The silicon carbide layer includes a drift region, a body region, and a source region. The MOSFET is configured such that a relational expression of n
Public/Granted literature
- US20160027878A1 SILICON CARBIDE SEMICONDUCTOR DEVICE Public/Granted day:2016-01-28
Information query
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