Invention Grant
- Patent Title: High-electron-mobility transistors
- Patent Title (中): 高电子迁移率晶体管
-
Application No.: US14581645Application Date: 2014-12-23
-
Publication No.: US09306014B1Publication Date: 2016-04-05
- Inventor: Alexey Kudymov , Jamal Ramdani , Linlin Liu
- Applicant: POWER INTEGRATIONS, INC.
- Applicant Address: US CA San Jose
- Assignee: POWER INTEGRATIONS, INC.
- Current Assignee: POWER INTEGRATIONS, INC.
- Current Assignee Address: US CA San Jose
- Agency: Mayer & Williams PC
- Agent Stuart H. Mayer
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/40 ; H01L29/66 ; H01L29/51

Abstract:
High-electron-mobility transistors that include field plates are described. In a first implementation, a HEMT includes a first and a second semiconductor material disposed to form a heterojunction at which a two-dimensional electron gas arises and source, a drain, and gate electrodes. The gate electrode is disposed to regulate conduction in the heterojunction between the source electrode and the drain electrode. The gate has a drain-side edge. A gate-connected field plate is disposed above a drain-side edge of the gate electrode and extends laterally toward the drain. A second field plate is disposed above a drain-side edge of the gate-connected field plate and extends laterally toward the drain.
Information query
IPC分类: