Invention Grant
- Patent Title: Bipolar junction transistor and operating and manufacturing method for the same
- Patent Title (中): 双极结晶体管的操作和制造方法相同
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Application No.: US13868134Application Date: 2013-04-23
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Publication No.: US09306043B2Publication Date: 2016-04-05
- Inventor: Li-Fan Chen , Wing-Chor Chan , Jeng Gong
- Applicant: MACRONIX INTERNATIONAL CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L29/735
- IPC: H01L29/735 ; H01L29/66 ; H01L29/40 ; H01L29/06

Abstract:
A bipolar junction transistor and an operating method and a manufacturing method for the same are provided. The bipolar junction transistor comprises a first doped region, a second doped region and a third doped region. The first doped region has a first type conductivity. The second doped region comprises well regions formed in the first doped region, having a second type conductivity opposite to the first type conductivity, and separated from each other by the first doped region. The third doped region has the first type conductivity. The third doped region is formed in the well regions or in the first doped region between the well regions.
Public/Granted literature
- US20140266407A1 BIPOLAR JUNCTION TRANSISTOR AND OPERATING AND MANUFACTURING METHOD FOR THE SAME Public/Granted day:2014-09-18
Information query
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