Invention Grant
- Patent Title: Hetero junction field effect transistor and method for manufacturing the same
- Patent Title (中): 异质结场效应晶体管及其制造方法
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Application No.: US14062284Application Date: 2013-10-24
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Publication No.: US09306049B2Publication Date: 2016-04-05
- Inventor: JaeHoon Lee , Chanho Park , NamYoung Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Onello & Mello, LLP
- Priority: KR10-2012-0133194 20121122
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/778 ; H01L29/423 ; H01L29/06 ; H01L29/10 ; H01L29/20

Abstract:
Hetero junction field effect transistors and methods of fabricating such transistors are disclosed wherein: a first compound semiconductor layer is provided on a substrate; a second compound semiconductor layer is provided on the first compound semiconductor layer; a gate insulating layer is provided on the second compound semiconductor layer; and a gate electrode is provided on the gate insulating layer such that the gate insulating layer penetrates the second compound semiconductor layer so as to be in contact with the first compound semiconductor layer.
Public/Granted literature
- US20140138747A1 HETERO JUNCTION FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-05-22
Information query
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