Invention Grant
US09306049B2 Hetero junction field effect transistor and method for manufacturing the same 有权
异质结场效应晶体管及其制造方法

Hetero junction field effect transistor and method for manufacturing the same
Abstract:
Hetero junction field effect transistors and methods of fabricating such transistors are disclosed wherein: a first compound semiconductor layer is provided on a substrate; a second compound semiconductor layer is provided on the first compound semiconductor layer; a gate insulating layer is provided on the second compound semiconductor layer; and a gate electrode is provided on the gate insulating layer such that the gate insulating layer penetrates the second compound semiconductor layer so as to be in contact with the first compound semiconductor layer.
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