Invention Grant
- Patent Title: Silicon light emitting device utilising reach-through effects
- Patent Title (中): 硅发光器件利用通透效应
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Application No.: US13161113Application Date: 2011-06-15
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Publication No.: US09306113B2Publication Date: 2016-04-05
- Inventor: Monuko Du Plessis
- Applicant: Monuko Du Plessis
- Applicant Address: ZA Pretoria
- Assignee: INSIAVA (PTY) LIMITED
- Current Assignee: INSIAVA (PTY) LIMITED
- Current Assignee Address: ZA Pretoria
- Agency: Nixon & Vanderhye, PC
- Priority: ZA2008/10604 20081215
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L33/00 ; H01L33/20 ; H01L33/34

Abstract:
A light emitting device comprises a body of an indirect bandgap semiconductor material. A junction region is formed between a first region in the body of a first doping kind and a second region of the body of a second doping kind of first concentration. A third region of the second doping kind of a second concentration is spaced from the junction region by the second region. The second concentration is higher than the first concentration. A terminal arrangement is connected to the body for, in use, reverse biasing the first junction region into a breakdown mode, thereby to cause emission of light. The device is configured such that a depletion region associated with the junction region reaches through the shaped region to reach the third region, before the junction enters the breakdown mode.
Public/Granted literature
- US20120009709A1 SILICON LIGHT EMITTING DEVICE UTILISING REACH-THROUGH EFFECTS Public/Granted day:2012-01-12
Information query
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