Invention Grant
US09306119B2 Semiconductor light-emitting element and manufacturing method thereof 有权
半导体发光元件及其制造方法

Semiconductor light-emitting element and manufacturing method thereof
Abstract:
Provided is a semiconductor light-emitting element in which dopant interdiffusion is suppressed, the efficiency at which a carrier is infused into an active layer is improved, and there is less of a decrease in light-emitting intensity (droop) during high-current driving at a high light-emitting efficiency. The semiconductor light-emitting element composed of a GaN-based semiconductor includes an n-type semiconductor layer, an active layer formed on the n-type semiconductor layer, a first semiconductor layer formed on the active layer and having a concave/convex structure layer in the surface, and a second semiconductor structure layer doped with Mg and formed on the first semiconductor layer.
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