Invention Grant
US09306137B2 Method of producing crystalline substrate having concave-convex structure 有权
具有凹凸结构的结晶基板的制造方法

Method of producing crystalline substrate having concave-convex structure
Abstract:
A method of producing the crystalline substrate having a concave-convex structure includes: (A) forming a transfer film by forming a concave-convex film on a support film on the surface having a concave-convex pattern thereon so that thickness of the residual film of the concave-convex film is 0.01 to 1 μm, the concave-convex pattern of the support film having concave parts with a width of 0.05 to 100 μm, a depth of 0.05 to 10 μm, and a ratio of the depth of the concave part to the width of the concave part of up to 1.5, (B) disposing the transfer film on the crystalline substrate, and transferring the concave-convex film onto the crystalline substrate to produce a crystalline substrate having the concave-convex film thereon, (C) etching the crystalline substrate having the concave-convex film thereon to form a concave-convex structure on the surface of a crystalline substrate.
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