Invention Grant
- Patent Title: MRAM device and fabrication method thereof
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Application No.: US14874149Application Date: 2015-10-02
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Publication No.: US09306158B2Publication Date: 2016-04-05
- Inventor: Chia-Shiung Tsai , Chern-Yow Hsu , Fu-Ting Sung , Shih-Chang Liu , Wei-Hang Huang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L43/12 ; H01L43/08 ; H01L43/10 ; H01L43/02

Abstract:
A method of forming and a magnetoresistive random access memory (MRAM) device. In an embodiment, the MRAM device includes a magnetic tunnel junction (MTJ) disposed over a bottom electrode, the magnetic tunnel junction having a first sidewall, a top electrode disposed over the magnetic tunnel junction, and a dielectric spacer supported by the magnetic tunnel junction and extending along sidewalls of the top electrode, the dielectric spacer having a second sidewall substantially co-planar with the first sidewall of the magnetic tunnel junction.
Public/Granted literature
- US20160028000A1 MRAM Device and Fabrication Method Thereof Public/Granted day:2016-01-28
Information query
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