Invention Grant
- Patent Title: Forming pn junction contacts by different dielectrics
- Patent Title (中): 通过不同的电介质形成pn结触点
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Application No.: US14742032Application Date: 2015-06-17
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Publication No.: US09306181B2Publication Date: 2016-04-05
- Inventor: Qing Cao , Shu-jen Han
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L51/05 ; H01L51/10 ; H01L51/00 ; H01L29/06 ; H01L21/02

Abstract:
A carbon nanotube transistor and method of manufacturing a carbon nanotube transistor is disclosed. The carbon nanotube transistor includes a carbon nanotube on a substrate, a gate electrode deposited on the carbon nanotube, and at least one of a source electrode and a drain electrode deposited on the carbon nanotube and separated from the gate electrode by a space region. The carbon nanotube is doped at the gate electrode an in the space region to form a p-n junction.
Public/Granted literature
- US20150311457A1 FORMING PN JUNCTION CONTACTS BY DIFFERENT DIELECTRICS Public/Granted day:2015-10-29
Information query
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