Invention Grant
- Patent Title: Impedance matching apparatus and impedance matching method
- Patent Title (中): 阻抗匹配装置和阻抗匹配方法
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Application No.: US14235661Application Date: 2012-07-20
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Publication No.: US09306534B2Publication Date: 2016-04-05
- Inventor: Won Suk Chung
- Applicant: Won Suk Chung
- Applicant Address: KR Seoul
- Assignee: LG INNOTEK CO., LTD.
- Current Assignee: LG INNOTEK CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: Saliwanchik, Lloyd & Eisenschenk
- Priority: KR10-2011-0075472 20110728
- International Application: PCT/KR2012/005805 WO 20120720
- International Announcement: WO2013/015572 WO 20130131
- Main IPC: H04B1/04
- IPC: H04B1/04 ; H03H7/40 ; H04B17/10 ; H04B1/403 ; H04B1/00 ; H03H7/38

Abstract:
Disclosed are an impedance matching apparatus and an impedance matching method thereof. The impedance matching apparatus performs impedance matching between a front end module and an antenna. The impedance matching apparatus includes a switching unit to selectively select multiple-band RF input signals, a power amplifying unit to amplify the RF input signal selected from the switching unit, a reflected power measuring unit to measure a reflection coefficient for the RF input signal, a matching unit to adjust a variable device so that the reflection coefficient is minimized, and a controller to provide a variable device value allowing the minimum reflection coefficient based on the amplified RF input signal and the reflection coefficient.
Public/Granted literature
- US20140170996A1 Impedance Matching Apparatus and Impedance Matching Method Public/Granted day:2014-06-19
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