Invention Grant
- Patent Title: Continuous diffusion configurable standard cell architecture
- Patent Title (中): 连续扩散可配置标准单元架构
-
Application No.: US14603262Application Date: 2015-01-22
-
Publication No.: US09306570B1Publication Date: 2016-04-05
- Inventor: Satyanarayana Sahu , Joshua Lance Puckett , Ohsang Kwon , William James Goodall, III , Benjamin John Bowers
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Agency: Arent Fox LLP
- Main IPC: H03K19/177
- IPC: H03K19/177 ; H01L25/00 ; H03K19/0175 ; H03K19/20 ; H01L27/118

Abstract:
At least one configurable circuit cell with a continuous active region includes at least one center subcell, a first-side subcell, and a second-side subcell. Each center subcell includes first and second pMOS transistors and first and second nMOS transistors. The first pMOS transistor has a first-pMOS-transistor gate, source, and drain. The first-pMOS-transistor source is coupled to a first voltage source. The second pMOS transistor has a second-pMOS-transistor gate, source, and drain. The second-pMOS-transistor source is coupled to the first voltage source. The first-pMOS-transistor drain and the second-pMOS-transistor drain are a same drain. The first nMOS transistor has a first-nMOS-transistor gate, source, and drain. The first-nMOS-transistor source is coupled to a second voltage source. The second nMOS transistor has a second-nMOS-transistor gate, source, and drain. The second-nMOS-transistor source is coupled to the second voltage source. The first-nMOS-transistor drain and the second-nMOS-transistor drain are a same drain.
Information query
IPC分类: