Invention Grant
- Patent Title: Method for recovery of cerium oxide
- Patent Title (中): 氧化铈回收方法
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Application No.: US13717905Application Date: 2012-12-18
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Publication No.: US09309447B2Publication Date: 2016-04-12
- Inventor: Harunobu Matsui , Daijitsu Harada , Masaki Takeuchi
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2011-276669 20111219
- Main IPC: B24B57/00
- IPC: B24B57/00 ; C09C1/68 ; C09K3/14 ; B03D3/00 ; B01D21/01 ; C02F1/52 ; C01F17/00 ; C09G1/02 ; B24B1/00 ; B24B7/19 ; B24D3/02 ; B01D21/00 ; C02F1/00

Abstract:
A method for recovery of cerium oxide from the abrasive waste composed mainly of cerium oxide arising from the polishing of glass substrates, said method including the steps of (i) adding to the abrasive waste an aqueous solution of a basic substance; (ii) adding to the resulting solution a precipitant, thereby forming precipitates composed mainly of cerium oxide, and removing the supernatant liquid; (iii) adding to the resulting precipitates a solution of an acid substance, thereby making said precipitate slightly acid to neutral; (iv) washing the precipitates with an organic solvent; and (v) drying and crushing the precipitates. The method males it possible to recycle abrasive waste into a pure abrasive composed mainly of cerium oxide which can be reused to polish synthetic quartz glass substrates for state-of-the-art semiconductor technology relating to photomasks and reticles.
Public/Granted literature
- US20130152483A1 METHOD FOR RECOVERY OF CERIUM OXIDE Public/Granted day:2013-06-20
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