Invention Grant
- Patent Title: Light source apparatus and projector
- Patent Title (中): 光源设备和投影机
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Application No.: US14184119Application Date: 2014-02-19
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Publication No.: US09310622B2Publication Date: 2016-04-12
- Inventor: Akira Egawa
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SEIKO EPSON CORPORATION
- Current Assignee: SEIKO EPSON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2013-032096 20130221
- Main IPC: G03B21/14
- IPC: G03B21/14 ; G02B27/48 ; F21V14/06 ; F21V14/08 ; G02B5/02 ; G02B5/04 ; F21S10/00 ; G03B21/20

Abstract:
A light source apparatus includes a light source unit, a light diffusion element that is provided so as to be rotated about a predetermined rotation shaft and includes a plurality of diffusion regions which are consecutively formed around the rotation shaft, and a motor that rotates the light diffusion element so that a region on which light from the light source unit is incident in the light diffusion element is moved between the plurality of diffusion regions. The plurality of diffusion regions include a first diffusion region, and a second diffusion region which has diffusion characteristics different from diffusion characteristics of the first diffusion region and is provided so as to be adjacent to the first diffusion region.
Public/Granted literature
- US20140232992A1 LIGHT SOURCE APPARATUS AND PROJECTOR Public/Granted day:2014-08-21
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