Invention Grant
- Patent Title: Target supply device and target supply method
- Patent Title (中): 目标供应装置和目标供应方式
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Application No.: US13953350Application Date: 2013-07-29
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Publication No.: US09310686B2Publication Date: 2016-04-12
- Inventor: Takayuki Yabu , Tamotsu Abe
- Applicant: GIGAPHOTON INC.
- Applicant Address: JP Tochigi
- Assignee: GIGAPHOTON INC.
- Current Assignee: GIGAPHOTON INC.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JP2012-171428 20120801
- Main IPC: B05B5/025
- IPC: B05B5/025 ; G03F7/20 ; B05B5/053 ; B05B12/02 ; H05G2/00

Abstract:
A target supply method uses a target supply device that includes a target generation unit having a nozzle, a pressure control unit having a pressure sensor and an actuator, an electrode, a potential application unit, and a timer; further, the method include raising the pressure inside the target generation unit to a setting pressure by the actuator, applying different potentials to the electrode and a target material from each other by the potential application unit in the case where it is detected that the pressure inside the target generation unit is halfway raised to the setting pressure, and applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit to extract the target material with electrostatic force in the case where it is detected that the pressure inside the target generation unit has been raised to the setting pressure.
Public/Granted literature
- US20140034759A1 TARGET SUPPLY DEVICE AND TARGET SUPPLY METHOD Public/Granted day:2014-02-06
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