Invention Grant
- Patent Title: Vapor phase chemical mechanical polishing of magnetic recording disks
- Patent Title (中): 磁记录盘的气相化学机械抛光
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Application No.: US14086927Application Date: 2013-11-21
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Publication No.: US09312141B2Publication Date: 2016-04-12
- Inventor: Thomas E. Karis , Bruno Marchon , Bala K. Pathem , Franck D. Rose dit Rose , Kurt A. Rubin , Erhard Schreck
- Applicant: HGST Netherlands B.V.
- Applicant Address: NL Amsterdam
- Assignee: HGST Netherlands B.V.
- Current Assignee: HGST Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/306 ; B81C1/00 ; H01L21/321 ; G11B5/84 ; B24B37/04
Abstract:
A method for polishing a carbon overcoat of a magnetic media that results in a smooth surface free of carbon cluster debris. The method involves forming a magnetic disk having a carbon overcoat formed thereon. The carbon overcoat is then polished in the presence of ozone (O3). The heat from the polishing process along with the presence of the ozone, cause any carbon particles removed by the polishing to form CO2 gas so that there is no remaining carbon particle debris on the surface of the disk.
Public/Granted literature
- US20150136730A1 VAPOR PHASE CHEMICAL MECHANICAL POLISHING OF MAGNETIC RECORDING DISKS Public/Granted day:2015-05-21
Information query
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