Invention Grant
- Patent Title: Recirculation substrate container purging systems and methods
- Patent Title (中): 循环基板容器清洗系统及方法
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Application No.: US14569662Application Date: 2014-12-13
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Publication No.: US09312152B2Publication Date: 2016-04-12
- Inventor: Lutz Rebstock
- Applicant: Brooks CCS GmbH
- Applicant Address: US MA Chelmsford
- Assignee: Brooks Automation, Inc.
- Current Assignee: Brooks Automation, Inc.
- Current Assignee Address: US MA Chelmsford
- Agency: Perman & Green, LLP
- Agent Colin C. Durham
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B9/032 ; H01L21/673
Abstract:
Methods and systems to reduce the consumption of purge gas for semiconductor substrate containers. The recirculation purging system recycles purge gas back to substrate containers by filtering and purifying gas flow from substrate containers, receiving gas flow from load port, or including a recirculation tank.
Public/Granted literature
- US20150170939A1 RECIRCULATION SUBSTRATE CONTAINER PURGING SYSTEMS AND METHODS Public/Granted day:2015-06-18
Information query
IPC分类:
