Invention Grant
US09312160B2 Wafer suction method, wafer suction stage, and wafer suction system
有权
晶圆抽吸法,晶片吸附台和晶片抽吸系统
- Patent Title: Wafer suction method, wafer suction stage, and wafer suction system
- Patent Title (中): 晶圆抽吸法,晶片吸附台和晶片抽吸系统
-
Application No.: US13617354Application Date: 2012-09-14
-
Publication No.: US09312160B2Publication Date: 2016-04-12
- Inventor: Hajime Akiyama , Akira Okada , Kinya Yamashita
- Applicant: Hajime Akiyama , Akira Okada , Kinya Yamashita
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee: MITSUBISHI ELECTRIC CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2012-071988 20120327
- Main IPC: B25B11/00
- IPC: B25B11/00 ; H01L21/677 ; H01L21/683 ; H01L21/687

Abstract:
A method of attaching a wafer by suction, includes a step of mounting a wafer on a right arm and a left arm of a transfer jig, moving the transfer jig toward a wafer suction stage in such a manner that a facing right arm surface of the right arm slides along and in contact with a first side surface of the wafer suction stage and a facing left arm surface of the left arm slides along and in contact with a second side surface of the wafer suction stage until the wafer comes to lie directly above a mounting surface of the wafer suction stage, mounting the wafer on the mounting surface by moving the transfer jig downward toward the wafer suction stage while maintaining the contacts, and attaching the wafer to the mounting surface by suction.
Public/Granted literature
- US20130256964A1 WAFER SUCTION METHOD, WAFER SUCTION STAGE, AND WAFER SUCTION SYSTEM Public/Granted day:2013-10-03
Information query