Invention Grant
- Patent Title: Systems and methods for a wafer scale atomic clock
- Patent Title (中): 晶圆级原子钟的系统和方法
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Application No.: US14059698Application Date: 2013-10-22
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Publication No.: US09312869B2Publication Date: 2016-04-12
- Inventor: Jeffrey James Kriz , James L. Tucker , Kenneth H. Heffner , Robert Compton
- Applicant: Honeywell International Inc.
- Applicant Address: US NJ Morris Plains
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morris Plains
- Agency: Fogg & Powers LLC
- Main IPC: H03L7/26
- IPC: H03L7/26 ; G04F5/14

Abstract:
Systems and methods for a wafer scale atomic clock are provided. In at least one embodiment, a wafer scale device comprises a first substrate; a cell layer joined to the first substrate, the cell layer comprising a plurality of hermetically isolated cells, wherein separate measurements are produced for each cell in the plurality of hermetically isolated cells; and a second substrate joined to the cell layer, wherein the first substrate and the second substrate comprise electronics to control the separate measurements, wherein the separate measurements are combined into a single measurement.
Public/Granted literature
- US20150109061A1 SYSTEMS AND METHODS FOR A WAFER SCALE ATOMIC CLOCK Public/Granted day:2015-04-23
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