Invention Grant
- Patent Title: Photoreactive monomers
- Patent Title (中): 光反应性单体
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Application No.: US14021040Application Date: 2013-09-09
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Publication No.: US09315445B2Publication Date: 2016-04-19
- Inventor: Dieter Urban , Ulrike Licht , Christopher Barner-Kowollik , Guillaume Delaittre , Elena Frick
- Applicant: BASF SE
- Applicant Address: DE Ludwigshafen
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: C07C69/54
- IPC: C07C69/54 ; C07C67/14 ; C07C67/28 ; C07C67/29 ; C07C45/64
Abstract:
Photoreactive monomer which has (i) at least one free-radically polymerizable C—C double bond, (ii) at least one hydrophilic group selected from an ethylene glycol group and a polyethylene glycol group having at least 2 ethylene glycol units and (iii) at least one photoreactive group, the photoreactive group being a photoenolizable carbonyl group, and also a method for preparing the photoreactive monomers.
Public/Granted literature
- US20140073810A1 PHOTOREACTIVE MONOMERS Public/Granted day:2014-03-13
Information query
