Invention Grant
- Patent Title: Semiconductor device and method of manufacturing same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US14716791Application Date: 2015-05-19
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Publication No.: US09318418B2Publication Date: 2016-04-19
- Inventor: Michihiro Kawashita , Yasuhiro Yoshimura , Naotaka Tanaka , Takahiro Naito , Takashi Akazawa
- Applicant: Tessera Advanced Technologies, Inc.
- Applicant Address: US CA San Jose
- Assignee: TESSERA ADVANCED TECHNOLOGIES, INC.
- Current Assignee: TESSERA ADVANCED TECHNOLOGIES, INC.
- Current Assignee Address: US CA San Jose
- Agency: Haynes and Boone, LLP
- Priority: JP2008-323581 20081219
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/48 ; H01L21/683 ; H01L21/768 ; H01L23/00 ; H01L25/065 ; H01L25/00 ; H01L23/538 ; H01L23/522 ; H01L23/528 ; H01L25/07

Abstract:
In a semiconductor device in which a plurality of semiconductor chips are stacked, performance is enhanced without deteriorating productivity. The semiconductor device has a first semiconductor substrate having a first surface and a second surface opposite the first surface, a first insulating film formed on the first surface, a first hole formed in the first insulating film and partially extending into the first semiconductor substrate, a second hole formed in the second surface, a first electrode entirely filling the first hole, and a conductive film conformally formed in the second hole. The conductive film is electrically connected to a bottom surface of the first electrode and leaves a third hole in the first semiconductor substrate open. The third hole is configured to receive a second electrode of a second semiconductor substrate.
Public/Granted literature
- US20150255374A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME Public/Granted day:2015-09-10
Information query
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