Invention Grant
US09318496B2 Nonvolatile memory device with layout to minimize void formation and method of making the same 有权
具有布局的非易失性存储器件,以最小化空隙形成及其制造方法

Nonvolatile memory device with layout to minimize void formation and method of making the same
Abstract:
A memory device can include an array of NOR memory cells, each memory cell including a floating gate, a source on a source side of the floating gate, a drain on a drain side of the floating gate, a drain contact on the drain, and a source contact on the source. The source contacts are connected to a common source line. A plurality of bit lines are connected to respective drains in a column of the memory cells. A plurality of word lines, each word line coupled to respective floating gates in a row of the memory cells. Spacing between the word lines on the drain side is greater than spacing between the word lines on the source side.
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