Invention Grant
US09318496B2 Nonvolatile memory device with layout to minimize void formation and method of making the same
有权
具有布局的非易失性存储器件,以最小化空隙形成及其制造方法
- Patent Title: Nonvolatile memory device with layout to minimize void formation and method of making the same
- Patent Title (中): 具有布局的非易失性存储器件,以最小化空隙形成及其制造方法
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Application No.: US14194938Application Date: 2014-03-03
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Publication No.: US09318496B2Publication Date: 2016-04-19
- Inventor: Anirban Roy
- Applicant: Anirban Roy
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Current Assignee Address: US TX Austin
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L27/02 ; H01L29/788

Abstract:
A memory device can include an array of NOR memory cells, each memory cell including a floating gate, a source on a source side of the floating gate, a drain on a drain side of the floating gate, a drain contact on the drain, and a source contact on the source. The source contacts are connected to a common source line. A plurality of bit lines are connected to respective drains in a column of the memory cells. A plurality of word lines, each word line coupled to respective floating gates in a row of the memory cells. Spacing between the word lines on the drain side is greater than spacing between the word lines on the source side.
Public/Granted literature
- US20150249091A1 NVM LAYOUT Public/Granted day:2015-09-03
Information query
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