Invention Grant
- Patent Title: Vapor deposition apparatus, deposition method, and method of manufacturing organic light-emitting display apparatus by using the same
- Patent Title (中): 蒸镀装置，蒸镀法及利用该有机发光显示装置的制造方法
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Application No.: US13944847Application Date: 2013-07-17
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Publication No.: US09318535B2Publication Date: 2016-04-19
- Inventor: Suk-Won Jung , Myung-Soo Huh , Choel-Min Jang
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Priority: KR10-2013-0016977 20130218
- Main IPC: H01L27/32
- IPC: H01L27/32 ; C23C16/455 ; H01J37/32 ; C23C16/44 ; C23C16/452 ; C23C16/50 ; H05H1/24 ; H01L51/56
Abstract:
Provided is a vapor deposition apparatus including: a plasma generator configured to change at least a portion of a first raw material gas into a radical form; a corresponding surface corresponding to the plasma generator; a reaction space between the plasma generator and the corresponding surface; and an insulating member separated from, and surrounding the plasma generator.
Public/Granted literature
Information query
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