Invention Grant
- Patent Title: Luminescent device and manufacturing method for luminescent device and semiconductor device
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Application No.: US14725635Application Date: 2015-05-29
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Publication No.: US09318653B2Publication Date: 2016-04-19
- Inventor: Yoshitaka Kadowaki , Tatsunori Toyota
- Applicant: DOWA ELECTRONICS MATERIALS CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: DOWA ELECTRONICS MATERIALS CO., LTD.
- Current Assignee: DOWA ELECTRONICS MATERIALS CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2011-007083 20110117
- Main IPC: H01L27/15
- IPC: H01L27/15 ; H01L33/12 ; H01L33/00 ; H01L33/02 ; H01L33/10 ; H01L33/32 ; H01L33/46 ; H01S5/042 ; H01S5/323

Abstract:
A luminescent device and a manufacturing method for the luminescent device and a semiconductor device which are free from occurrence of cracks in a compound semiconductor layer due to the internal stress in the compound semiconductor layer at the time of chemical lift-off. The luminescent device manufacturing method includes forming a device region on part of an epitaxial substrate through a lift-off layer; forming a sacrificing portion, being not removed in a chemical lift-off step, around device region on epitaxial substrate; covering epitaxial substrate and semiconductor layer and forming a covering layer such that level of surface thereof in the region away from device region is lower than luminescent layer surface; removing covering layer on semiconductor layer, and that on sacrificing portion surface; forming a reflection layer on covering layer surface and semiconductor layer surface; and forming a supporting substrate by providing plating on reflection layer.
Public/Granted literature
- US20150295129A1 LUMINESCENT DEVICE AND MANUFACTURING METHOD FOR LUMINESCENT DEVICE AND SEMICONDUCTOR DEVICE Public/Granted day:2015-10-15
Information query
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