Invention Grant
US09321085B2 Substrate processing method, storage medium storing computer program for implementing substrate processing method and substrate processing apparatus
有权
基板处理方法,存储用于实现基板处理方法的计算机程序的存储介质和基板处理装置
- Patent Title: Substrate processing method, storage medium storing computer program for implementing substrate processing method and substrate processing apparatus
- Patent Title (中): 基板处理方法,存储用于实现基板处理方法的计算机程序的存储介质和基板处理装置
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Application No.: US13687142Application Date: 2012-11-28
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Publication No.: US09321085B2Publication Date: 2016-04-26
- Inventor: Teruomi Minami , Satoru Tanaka , Tatsuya Nagamatsu , Hiroyuki Suzuki , Yosuke Kawabuchi , Tsukasa Hirayama , Katsufumi Matsuki
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2011-262678 20111130
- Main IPC: B08B3/04
- IPC: B08B3/04 ; B08B7/04 ; H01L21/67

Abstract:
A chemical liquid process is performed on a substrate. Then, a rinse process that supplies a rinse liquid to the substrate is performed. Thereafter, a drying process that dries the substrate is performed while rotating the substrate. The drying process includes a first drying process that rotates the substrate at a first rotational speed; a second drying process that decreases the rotational speed of the substrate to a second rotational speed lower than the first rotational speed after the first drying process. In the second drying process, the rinse liquid and a drying solution are agitated and substituted while generating braking effect. In a third drying process, the rotational speed of the substrate is increased from the second rotational speed to a third rotational speed after the second drying process. Thereafter, in a fourth drying process, the drying solution on the substrate is scattered away by rotating the substrate.
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