Invention Grant
- Patent Title: Method for the surface treatment of a semiconductor substrate
- Patent Title (中): 半导体衬底的表面处理方法
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Application No.: US14836131Application Date: 2015-08-26
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Publication No.: US09321269B1Publication Date: 2016-04-26
- Inventor: Vincenza Di Palma , Fabrizio Porro
- Applicant: STMicroelectronics S.r.l.
- Applicant Address: IT Agrate Brianza
- Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee Address: IT Agrate Brianza
- Agency: Gardere Wynne Sewell LLP
- Priority: ITTO2014A1089 20141222
- Main IPC: B41J2/135
- IPC: B41J2/135 ; B41J2/16 ; B41J2/14

Abstract:
A method for application of an anti-wetting coating to a substrate of a semiconductor material is described. The method includes applying to a support a solution of a hydrocarbon comprising at least one unsaturated bond and, optionally, at least one hetero-atom for obtaining a layer of hydrocarbons. The method also includes treating at least one surface of the substrate of the semiconductor material with an acid. The layer of hydrocarbons is transferred from the support to the surface of the substrate of the semiconductor material. The layer of hydrocarbons is chemically coupled with the surface of the substrate of the semiconductor material. The method may be applied to an integrated ink jet printhead provided with a nozzle plate in which the nozzle plate serves as the substrate of the semiconductor material.
Information query
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