Invention Grant
- Patent Title: Photosensitive resin composition
- Patent Title (中): 感光树脂组合物
-
Application No.: US14116241Application Date: 2012-05-09
-
Publication No.: US09321862B2Publication Date: 2016-04-26
- Inventor: Shojiro Yukawa
- Applicant: Shojiro Yukawa
- Applicant Address: JP Tokyo
- Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2011-113844 20110520
- International Application: PCT/JP2012/061882 WO 20120509
- International Announcement: WO2012/160975 WO 20121129
- Main IPC: C08F2/46
- IPC: C08F2/46 ; C08F2/50 ; C08G61/04 ; C08F26/06 ; C08F12/22 ; C08F212/14 ; C08F12/08 ; G03F7/00 ; G03F7/023

Abstract:
There is provided provide a photosensitive resin composition which can markedly improve transparency, heat resistance, heat discoloration resistance, solvent resistance, and patterning properties. A photosensitive resin composition including: a polymer (A) in which a content of a unit structure containing a boronic acid group, a unit structure containing a boronic acid ester group, or a combination of these unit structures is 20 mol % to 100 mol % of a total molar number of unit structures constituting the polymer; and a photosensitizer (B). The polymer (A) preferably has a weight average molecular weight of 1,000 to 50,000. A cured film obtained from the photosensitive resin composition. A microlens prepared from the photosensitive resin composition.
Public/Granted literature
- US20140080937A1 PHOTOSENSITIVE RESIN COMPOSITION Public/Granted day:2014-03-20
Information query