Invention Grant
- Patent Title: Vacuum quality measurement system
- Patent Title (中): 真空质量测量系统
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Application No.: US13508644Application Date: 2010-11-08
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Publication No.: US09322738B2Publication Date: 2016-04-26
- Inventor: Gerardo A. Brucker , Kenneth D. Van Antwerp, Jr.
- Applicant: Gerardo A. Brucker , Kenneth D. Van Antwerp, Jr.
- Applicant Address: US MA Andover
- Assignee: MKS Instruments, Inc.
- Current Assignee: MKS Instruments, Inc.
- Current Assignee Address: US MA Andover
- Agency: Hamilton, Brook, Smith & Reynolds, P.C.
- International Application: PCT/US2010/055852 WO 20101108
- International Announcement: WO2011/057201 WO 20110512
- Main IPC: G01M3/34
- IPC: G01M3/34 ; G01L21/02 ; G01M3/22 ; G01M3/20

Abstract:
A gas analyzer for a vacuum chamber includes processing electronics configured to receive mass spectral data, receive input of total pressure in the vacuum chamber, receive external input from at least one sensor, and employ the mass spectral data, the total pressure in the vacuum chamber, and the external input from the at least one sensor to calculate a vacuum quality index based on at least one criteria of quality.
Public/Granted literature
- US20120227465A1 Vacuum Quality Measurement System Public/Granted day:2012-09-13
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