Invention Grant
US09322788B2 Surface inspection apparatus, method for inspecting surface, exposure system, and method for producing semiconductor device
有权
表面检查装置，表面检查方法，曝光系统以及半导体装置的制造方法
- Patent Title: Surface inspection apparatus, method for inspecting surface, exposure system, and method for producing semiconductor device
- Patent Title (中): 表面检查装置，表面检查方法，曝光系统以及半导体装置的制造方法
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Application No.: US14886847Application Date: 2015-10-19
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Publication No.: US09322788B2Publication Date: 2016-04-26
- Inventor: Kazuhiko Fukazawa , Yoshihiko Fujimori , Shinsuke Takeda
- Applicant: Nikon Corporation
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2010-278308 20101214; JP2011-004306 20110112
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01N21/95 ; G01N21/956
Abstract:
A surface inspection apparatus includes: a detection unit configured to detect a first detection signal according to a first diffracted light beam and a second detection signal according to a second diffracted light beam; a storage unit which is configured to store a first reference data and a second reference data; and a determination unit which is configured to determine a processing condition of the pattern in the substrate as an inspection object substrate, based on consistency between the first detection signal and the first reference data, and consistency between the second detection signal and the second reference data.
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