Invention Grant
US09322792B2 X-ray diffraction apparatus and method of measuring X-ray diffraction
有权
X射线衍射装置和X射线衍射测定方法
- Patent Title: X-ray diffraction apparatus and method of measuring X-ray diffraction
- Patent Title (中): X射线衍射装置和X射线衍射测定方法
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Application No.: US14164618Application Date: 2014-01-27
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Publication No.: US09322792B2Publication Date: 2016-04-26
- Inventor: Shintaro Kobayashi , Toru Mitsunaga , Koichi Kajiyoshi , Kazuyoshi Arai
- Applicant: RIGAKU CORPORATION
- Applicant Address: JP Tokyo
- Assignee: RIGAKU CORPORATION
- Current Assignee: RIGAKU CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2013-243506 20131126
- Main IPC: H05G1/00
- IPC: H05G1/00 ; G01N23/207

Abstract:
There is provided an X-ray diffraction apparatus configured to irradiate a sample S on a sample stage with X-rays generated from an X-ray source and detect the X-rays diffracted by a sample using a detector, including a virtual mask setting section and a signal processing section. The detector outputs detection signals according to intensity of the X-rays received by detection elements, for each of the plurality of detection elements forming a detection surface. The virtual mask setting section is capable of setting a virtual mask on the detection surface of the detector, and setting at least an opening dimension of the virtual mask as an opening condition of the virtual mask independently in an X direction and a Y direction. The signal processing section processes the detection signals outputted from the detector according to the opening condition of the virtual mask set in the virtual mask setting section.
Public/Granted literature
- US20150146861A1 X-RAY DIFFRACTION APPARATUS AND METHOD OF MEASURING X-RAY DIFFRACTION Public/Granted day:2015-05-28
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