Invention Grant
- Patent Title: Method for producing a diffraction grating
- Patent Title (中): 衍射光栅的制造方法
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Application No.: US14124002Application Date: 2012-06-07
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Publication No.: US09323070B2Publication Date: 2016-04-26
- Inventor: Henri Johannes Petrus Vink , Huibert Visser , Aaldert Hidde Van Amerongen
- Applicant: Henri Johannes Petrus Vink , Huibert Visser , Aaldert Hidde Van Amerongen
- Applicant Address: NL Delft
- Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Current Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Current Assignee Address: NL Delft
- Agency: Banner & Witcoff, Ltd.
- Priority: EP11169180 20110608
- International Application: PCT/NL2012/050397 WO 20120607
- International Announcement: WO2012/169889 WO 20121213
- Main IPC: G02B27/42
- IPC: G02B27/42 ; G02B5/18 ; H01S3/08 ; H01S3/092 ; H01S3/0933 ; G01J3/18 ; H01S3/16 ; G02B5/00 ; G01J3/24

Abstract:
A manufacturing method for a grating is disclosed for the angular dispersion of light impinging the grating. The grating comprises tapered structures and cavities. A cavity width and/or corrugation amplitude is varied for achieving a desired grating efficiency according to calculation. A method is disclosed for conveniently creating gratings with variable cavity width and/or corrugation amplitude. The method comprises the step of anisotropically etching a groove pattern into a grating master. Optionally a replica is produced that is complementary to the grating master. By variation of an etching resist pattern, the cavity width of the grating may be varied allowing the optimization towards different efficiency goals.
Public/Granted literature
- US20150034591A1 METHOD FOR PRODUCING A DIFFRACTION GRATING Public/Granted day:2015-02-05
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