Invention Grant
US09323160B2 Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
有权
液浸部件，曝光装置，曝光方法，装置制造方法，程序和记录介质
- Patent Title: Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
- Patent Title (中): 液浸部件，曝光装置，曝光方法，装置制造方法，程序和记录介质
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Application No.: US13793667Application Date: 2013-03-11
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Publication No.: US09323160B2Publication Date: 2016-04-26
- Inventor: Yuichi Shibazaki
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03F7/20
Abstract:
A liquid immersion member forms a liquid immersion space on an object movable below an optical member so that the light path of exposure light emitted from an emission surface of an optical member is filled with liquid. The liquid immersion member includes a first member disposed in at least a portion of the periphery of the optical member, and a second member which is movable at the outside of at least a portion of the first member and which includes a recovery port that recovers at least a portion of the liquid in the liquid immersion space.
Public/Granted literature
Information query
