Invention Grant
- Patent Title: Cylindrical reticle system, exposure apparatus and exposure method
- Patent Title (中): 圆柱标线系统,曝光装置和曝光方法
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Application No.: US14029939Application Date: 2013-09-18
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Publication No.: US09323163B2Publication Date: 2016-04-26
- Inventor: Qiang Wu , Yiming Gu
- Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
- Applicant Address: CN Shanghai
- Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee Address: CN Shanghai
- Agency: Anova Law Group, PLLC
- Priority: CN201310069607 20130305
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20

Abstract:
A cylindrical reticle system is provided for performing a unidirectional scan-exposure. The cylindrical reticle system includes a base and a center shaft fixed a one side of the base. The cylindrical reticle system also includes a first bearing fixed at the end of the center shaft near to the base and a second bearing fixed at the other end of the center shaft far from the base. Further, the cylindrical reticle system includes a cylindrical reticle having an imaging region and two non-imaging regions at both end of the imaging region.
Public/Granted literature
- US20140253895A1 CYLINDRICAL RETICLE SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD Public/Granted day:2014-09-11
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