Invention Grant
US09324381B2 Antifuse OTP memory cell with performance improvement, and manufacturing method and operating method of memory
有权
防毒OTP存储单元具有性能改进,以及内存的制造方法和操作方法
- Patent Title: Antifuse OTP memory cell with performance improvement, and manufacturing method and operating method of memory
- Patent Title (中): 防毒OTP存储单元具有性能改进,以及内存的制造方法和操作方法
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Application No.: US14606032Application Date: 2015-01-27
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Publication No.: US09324381B2Publication Date: 2016-04-26
- Inventor: Meng-Yi Wu , Hsin-Ming Chen , Chun-Hung Lu
- Applicant: eMemory Technology Inc.
- Applicant Address: TW Hsinchu
- Assignee: eMemory Technology Inc.
- Current Assignee: eMemory Technology Inc.
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Main IPC: G11C17/16
- IPC: G11C17/16 ; G11C5/06 ; G11C16/04 ; G11C17/18 ; H01L27/112 ; H01L29/423 ; H01L29/78 ; H01L27/115 ; H01L29/51 ; H01L23/525 ; H01L29/93

Abstract:
An OTP memory cell including an antifuse unit and a select transistor is provided. The antifuse unit includes an antifuse layer and an antifuse gate disposed on a substrate in sequence, a modified extension doped region disposed in the substrate below the antifuse layer, and a first doped region and a second doped region disposed in the substrate at two opposite sides of the antifuse gate. The select transistor includes a select gate, a gate dielectric layer, a second doped region, and a third doped region. The select gate is disposed on the substrate. The gate dielectric layer is disposed between the select gate and the substrate. The second and the third doped region are respectively disposed in the substrate at two opposite sides of the select gate. The doped region, the antifuse layer and the antifuse gate form a varactor.
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