Invention Grant
US09324701B2 Diode circuit layout topology with reduced lateral parasitic bipolar action
有权
二极管电路布局拓扑结构具有减少的侧向寄生双极作用
- Patent Title: Diode circuit layout topology with reduced lateral parasitic bipolar action
- Patent Title (中): 二极管电路布局拓扑结构具有减少的侧向寄生双极作用
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Application No.: US14177670Application Date: 2014-02-11
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Publication No.: US09324701B2Publication Date: 2016-04-26
- Inventor: Jeremy C. Smith , Anirudh Oberoi , William Moore , Michael Khazhinsky
- Applicant: Silicon Laboratories Inc.
- Applicant Address: US TX Austin
- Assignee: Silicon Laboratories Inc.
- Current Assignee: Silicon Laboratories Inc.
- Current Assignee Address: US TX Austin
- Agency: Egan, Peterman, Enders & Huston LLP
- Main IPC: H01L29/47
- IPC: H01L29/47 ; H01L27/02 ; H01L29/861 ; H01L29/06

Abstract:
Diode circuit layout topologies and methods are disclosed that exhibit reduced lateral parasitic bipolar characteristics at lateral parasitic bipolar circuit emitter edges during ESD or other voltage events as compared to conventional circuit layout topologies. The disclosed diode circuit layout topologies may be implemented to recess parasitic emitter ends relative to surrounding well ties, for example, to reduce or substantially eliminate parasitic bipolar action at lateral emitter edges of the circuitry during ESD events so as to provide higher current threshold for device failure, allowing for smaller device area and/or improved ESD robustness for a given circuit device.
Public/Granted literature
- US20150228638A1 Diode Circuit Layout Topology With Reduced Lateral Parasitic Bipolar Action Public/Granted day:2015-08-13
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