Invention Grant
- Patent Title: Power semiconductor device
- Patent Title (中): 功率半导体器件
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Application No.: US13716803Application Date: 2012-12-17
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Publication No.: US09324708B2Publication Date: 2016-04-26
- Inventor: Liutauras Storasta , Arnost Kopta , Munaf Rahimo
- Applicant: ABB Technology AG
- Applicant Address: CH Zurich
- Assignee: ABB Technology AG
- Current Assignee: ABB Technology AG
- Current Assignee Address: CH Zurich
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: EP10166258 20100617
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L29/06 ; H01L29/10 ; H01L29/739

Abstract:
An exemplary power semiconductor device with a wafer having an emitter electrode on an emitter side and a collector electrode on a collector side, an (n-) doped drift layer, an n-doped first region, a p-doped base layer, an n-doped source region, and a gate electrode, all of which being formed between the emitter and collector electrodes. The emitter electrode contacts the base layer and the source region within a contact area. An active semiconductor cell is formed within the wafer, and includes layers that lie in orthogonal projection with respect to the emitter side of the contact area of the emitter electrode. The device also includes a p-doped well, which is arranged in the same plane as the base layer, but outside the active cell. The well is electrically connected to the emitter electrode at least one of directly or via the base layer.
Public/Granted literature
- US20130099279A1 POWER SEMICONDUCTOR DEVICE Public/Granted day:2013-04-25
Information query
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