Invention Grant
US09324901B2 Precursor solution for forming a semiconductor thin film on the basis of CIS, CIGS or CZTS 有权
基于CIS,CIGS或CZTS形成半导体薄膜的前体溶液

Precursor solution for forming a semiconductor thin film on the basis of CIS, CIGS or CZTS
Abstract:
The present invention relates to a precursor solution for forming a semiconductor thin film on the basis of CIS, CIGS or CZTS by printing, comprising metal complexes of at least two different metal cations, wherein the first metal cation is a copper cation and the second is selected from the group consisting of (i) In, (ii) a combination of In and Ga, and (iii) a combination of Zn and Sn, wherein Cu and Sn, if Sn is present, is/are complexed by at least one sulfur or selenium containing anionic complex ligand or polyanion selected from the group consisting of trithiocarbonate, polysulfide or the selenium analogs thereof. If In, In with Ga, or Zn is present, their cations are complexed by an excess of trithiocarbonate and/or triselenocarbonate, and a solvent. A method for preparing such solutions and their use for manufacturing a solar cell or optoelectronic device is provided.
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