Invention Grant
- Patent Title: Semiconductor light-emitting device and process for production thereof
- Patent Title (中): 半导体发光装置及其制造方法
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Application No.: US12712693Application Date: 2010-02-25
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Publication No.: US09324914B2Publication Date: 2016-04-26
- Inventor: Akira Fujimoto , Ryota Kitagawa , Koji Asakawa
- Applicant: Akira Fujimoto , Ryota Kitagawa , Koji Asakawa
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-199416 20090831
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/38 ; H01L33/40

Abstract:
A semiconductor light-emitting device capable of keeping high luminance intensity even if electric power increases, and suitable for lighting instruments such as lights and lamps. The semiconductor device includes a metal electrode layer provided with openings, and is so large in size that the electrode layer has, for example, an area of 1 mm2 or more. The openings have a mean diameter of 10 nm to 2 μm, and penetrate through the metal electrode layer. The metal electrode layer can be produced by use of self-assembling of block copolymer or by nano-imprinting techniques.
Public/Granted literature
- US20110049556A1 SEMICONDUCTOR LIGHT-EMITTING DEVICE AND PROCESS FOR PRODUCTION THEREOF Public/Granted day:2011-03-03
Information query
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