Invention Grant
- Patent Title: Shadow mask alignment and management system
- Patent Title (中): 阴影面具对齐和管理系统
-
Application No.: US12905460Application Date: 2010-10-15
-
Publication No.: US09325007B2Publication Date: 2016-04-26
- Inventor: Byung-Sung Leo Kwak , Stefan Bangert , Ralf Hofmann , Michael Koenig
- Applicant: Byung-Sung Leo Kwak , Stefan Bangert , Ralf Hofmann , Michael Koenig
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Main IPC: C23C16/50
- IPC: C23C16/50 ; C23C16/00 ; C23F1/00 ; H01L21/306 ; H01M4/58 ; H01M4/13 ; H01M4/139 ; H01M4/62 ; H01M4/66 ; C23C14/04 ; H01M4/02
Abstract:
A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.
Public/Granted literature
- US20110131792A1 SHADOW MASK ALIGNMENT AND MANAGEMENT SYSTEM Public/Granted day:2011-06-09
Information query
IPC分类:
