Invention Grant
- Patent Title: Alignment system and extreme ultraviolet light generation system
- Patent Title (中): 对准系统和极紫外光发生系统
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Application No.: US14238405Application Date: 2012-09-05
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Publication No.: US09325150B2Publication Date: 2016-04-26
- Inventor: Masato Moriya , Osamu Wakabayashi
- Applicant: Masato Moriya , Osamu Wakabayashi
- Applicant Address: JP Tochigi
- Assignee: GIGAPHOTON INC
- Current Assignee: GIGAPHOTON INC
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JP2011-224213 20111011
- International Application: PCT/IB2012/001713 WO 20120905
- International Announcement: WO2013/054163 WO 20130418
- Main IPC: H05G2/00
- IPC: H05G2/00 ; H01S3/101 ; H01S3/23 ; H01S3/00

Abstract:
An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.
Public/Granted literature
- US20140191108A1 ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM Public/Granted day:2014-07-10
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