Invention Grant
- Patent Title: Print masks for multiple pass print modes
- Patent Title (中): 打印多页打印模式的面具
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Application No.: US14423813Application Date: 2012-09-06
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Publication No.: US09327535B2Publication Date: 2016-05-03
- Inventor: Jaime Fernandez , Yngvar Rossow , Utpal Sarkar
- Applicant: Jaime Fernandez , Yngvar Rossow , Utpal Sarkar
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Agency: HP Inc. Patent Department
- International Application: PCT/EP2012/067397 WO 20120906
- International Announcement: WO2014/037040 WO 20140313
- Main IPC: B41J2/015
- IPC: B41J2/015 ; B41J29/38 ; B41J2/145 ; B41J2/135 ; G06K15/10

Abstract:
Print masks for multiple pass print modes are described herein. In at least some examples herein, the print mask includes mask matrices. The mask matrices define a single nozzle actuation pattern. The nozzle actuation pattern is irregular. In at least some examples herein, techniques for printing of an image on a substrate are described. During printing the image on the substrate a print mask is applied such that, for each pass, the inkjet nozzles in the print head are actuated according to the single nozzle actuation pattern.
Public/Granted literature
- US20150273908A1 PRINT MASKS FOR MULTIPLE PASS PRINT MODES Public/Granted day:2015-10-01
Information query
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