Invention Grant
- Patent Title: Substrate processing apparatus and substrate processing method for performing cleaning process and the like on substrate
- Patent Title (中): 在基板上进行清洗处理等的基板处理装置及基板处理方法
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Application No.: US14019595Application Date: 2013-09-06
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Publication No.: US09327918B2Publication Date: 2016-05-03
- Inventor: Motoyasu Hayashi , Jun Shibukawa , Mitsukazu Takahashi
- Applicant: DAINIPPON SCREEN MFG. CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Ostrolenk Faber LLP
- Priority: JP2012-219502 20121001
- Main IPC: H01L21/677
- IPC: H01L21/677 ; B65G49/00 ; H01L21/67 ; H01L21/687
Abstract:
For the transport of a substrate from a cassette to a back surface cleaning processing unit in a cleaning processing block, a transfer robot rotates the substrate through 90 degrees from a horizontal attitude in which the front surface of the substrate is positioned to face upward into a standing attitude while transporting the substrate out of a cassette to a substrate passing part, and passes the substrate in the standing attitude to the substrate passing part. The substrate passing part holds the substrate in the standing attitude. A main transport robot receives the substrate held in the standing attitude. The main transport robot rotates the substrate through 90 degrees from the standing attitude into a horizontal attitude in which the back surface of the substrate is positioned to face upward while transporting the substrate from the substrate passing part to the back surface cleaning processing unit.
Public/Granted literature
Information query
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