Invention Grant
- Patent Title: Physical vapor deposition tile arrangement and physical vapor deposition arrangement
- Patent Title (中): 物理气相沉积瓦片布置和物理气相沉积布置
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Application No.: US14062959Application Date: 2013-10-25
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Publication No.: US09328410B2Publication Date: 2016-05-03
- Inventor: Bernd Teichert , Klaus Schneider , Christoph Kaiser , Michael Rivkin , George Arthur Proulx
- Applicant: VON ARDENNE GmbH , First Solar, Inc.
- Applicant Address: US OH Perrysburg DE Dresden
- Assignee: First Solar, Inc.,VON ARDENNE GmbH
- Current Assignee: First Solar, Inc.,VON ARDENNE GmbH
- Current Assignee Address: US OH Perrysburg DE Dresden
- Agency: Viering, Jentschura & Partner mbB
- Main IPC: C23C14/34
- IPC: C23C14/34 ; H01J37/34 ; C23C14/35 ; C23C14/08
Abstract:
In various embodiments, a physical vapor deposition tile arrangement is provided. The physical vapor deposition tile arrangement may include a plurality of physical vapor deposition tiles arranged next to each other; and a resilient structure configured to press the plurality of physical vapor deposition tiles together.
Public/Granted literature
- US20150114824A1 PHYSICAL VAPOR DEPOSITION TILE ARRANGEMENT AND PHYSICAL VAPOR DEPOSITION ARRANGEMENT Public/Granted day:2015-04-30
Information query
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