Invention Grant
- Patent Title: Methods for the deposition of manganese-containing films using diazabutadiene-based precursors
- Patent Title (中): 使用基于二氮杂二丁烯的前体沉积含锰膜的方法
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Application No.: US14296897Application Date: 2014-06-05
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Publication No.: US09328415B2Publication Date: 2016-05-03
- Inventor: David Thompson , Jeffrey W. Anthis
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C23C16/18
- IPC: C23C16/18 ; C23C16/06 ; C23C16/455 ; C23C16/34 ; H01L21/285 ; H01L23/532 ; H01L21/768
Abstract:
Methods and precursors are provided for deposition of films comprising manganese on surfaces using metal coordination complexes comprising a diazabutadiene-based ligand. Certain methods comprise exposing a substrate surface to a manganese precursor, and exposing the substrate surface to a tertiary amine.
Public/Granted literature
- US20140363575A1 Methods for the Deposition Of Manganese-Containing Films Using Diazabutadiene-Based Precursors Public/Granted day:2014-12-11
Information query
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