Invention Grant
- Patent Title: Method of forming a patterned polymer layer
- Patent Title (中): 形成图案化聚合物层的方法
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Application No.: US14487216Application Date: 2014-09-16
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Publication No.: US09328418B2Publication Date: 2016-05-03
- Inventor: Carolyn Rae Ellinger , Shelby Forrester Nelson
- Applicant: Carolyn Rae Ellinger , Shelby Forrester Nelson
- Applicant Address: US NY Rochester
- Assignee: EASTMAN KODAK COMPANY
- Current Assignee: EASTMAN KODAK COMPANY
- Current Assignee Address: US NY Rochester
- Agent William R. Zimmerli
- Main IPC: H01L21/469
- IPC: H01L21/469 ; C23C16/455 ; H01B19/04 ; H01L21/314
Abstract:
A method of producing a patterned polymeric insulator includes providing a substrate. A patterned polymeric inhibitor is provided on the substrate. An inorganic thin film is deposited using an atomic layer deposition process on the substrate in an area where the patterned polymeric inhibitor is absent. A material layer is deposited over the inorganic thin film and the patterned polymeric inhibitor.
Public/Granted literature
- US20160076146A1 METHOD OF FORMING A PATTERNED POLYMER LAYER Public/Granted day:2016-03-17
Information query
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