Invention Grant
US09328431B2 Apparatus for manufacturing a silicon carbide single crystal comprising a mounting portion and a purge gas introduction system 有权
包括安装部分和吹扫气体引入系统的碳化硅单晶的制造装置

Apparatus for manufacturing a silicon carbide single crystal comprising a mounting portion and a purge gas introduction system
Abstract:
An apparatus for manufacturing a silicon carbide single crystal grows the silicon carbide single crystal on a surface of a seed crystal made from a silicon carbide single crystal substrate by supplying a material gas for silicon carbide from below the seed crystal. The apparatus includes a base having a first side and a second side opposite to the first side. The seed crystal is mounted on the first side of the base. The apparatus further includes a purge gas introduction mechanism for supporting the base and for supplying a purge gas to the base from the second side of the base. The base has a purge gas introduction path for discharging the supplied purge gas from the base toward an outer edge of the seed crystal.
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