Invention Grant
- Patent Title: Apparatus for manufacturing a silicon carbide single crystal comprising a mounting portion and a purge gas introduction system
- Patent Title (中): 包括安装部分和吹扫气体引入系统的碳化硅单晶的制造装置
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Application No.: US13325233Application Date: 2011-12-14
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Publication No.: US09328431B2Publication Date: 2016-05-03
- Inventor: Kazukuni Hara , Yuuichirou Tokuda
- Applicant: Kazukuni Hara , Yuuichirou Tokuda
- Applicant Address: JP Kariya
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya
- Agency: Posz Law Group, PLC
- Priority: JP2010-280309 20101216
- Main IPC: C30B25/14
- IPC: C30B25/14 ; C30B25/16 ; C30B29/36 ; C30B25/12

Abstract:
An apparatus for manufacturing a silicon carbide single crystal grows the silicon carbide single crystal on a surface of a seed crystal made from a silicon carbide single crystal substrate by supplying a material gas for silicon carbide from below the seed crystal. The apparatus includes a base having a first side and a second side opposite to the first side. The seed crystal is mounted on the first side of the base. The apparatus further includes a purge gas introduction mechanism for supporting the base and for supplying a purge gas to the base from the second side of the base. The base has a purge gas introduction path for discharging the supplied purge gas from the base toward an outer edge of the seed crystal.
Public/Granted literature
- US20120152165A1 APPARATUS AND METHOD FOR MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL Public/Granted day:2012-06-21
Information query
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