Invention Grant
US09329475B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device
有权
正型感光性树脂组合物，通过使用其制备的感光性树脂膜和显示装置
- Patent Title: Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device
- Patent Title (中): 正型感光性树脂组合物，通过使用其制备的感光性树脂膜和显示装置
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Application No.: US14283274Application Date: 2014-05-21
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Publication No.: US09329475B2Publication Date: 2016-05-03
- Inventor: Ran Namgung , Hyo-Young Kwon , Hwan-Sung Cheon
- Applicant: Cheil Industries Inc.
- Applicant Address: KR Gumi-si
- Assignee: Cheil Industries Inc.
- Current Assignee: Cheil Industries Inc.
- Current Assignee Address: KR Gumi-si
- Agency: Additon, Higgins & Pendleton, P.A.
- Priority: KR10-2013-0126541 20131023
- Main IPC: G03F7/023
- IPC: G03F7/023 ; C08G69/26 ; C08G73/22 ; G03F7/039
Abstract:
Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor including a functional group at a terminal end thereof, wherein the functional group is dissociated by light of about 400 nm to about 550 nm wavelength region and is acidified; (B) a photosensitive diazoquinone compound; and (C) a solvent, and a photosensitive resin film and a display device using the same.
Public/Granted literature
Information query
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