Invention Grant
US09329490B2 Pattern formation method, mask for exposure, and exposure apparatus
有权
图案形成方法,曝光用掩模和曝光装置
- Patent Title: Pattern formation method, mask for exposure, and exposure apparatus
- Patent Title (中): 图案形成方法,曝光用掩模和曝光装置
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Application No.: US14095533Application Date: 2013-12-03
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Publication No.: US09329490B2Publication Date: 2016-05-03
- Inventor: Takashi Sato , Ryoichi Inanami , Shinichi Ito , Satoshi Tanaka
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2013-170794 20130820
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03F7/20

Abstract:
According to one embodiment, a pattern formation method includes preparing a mask pattern for interference, producing Talbot interference, and forming a pattern by blocking a part of interference light. The mask pattern for interference is arranged periodically a plurality of light transmissive portions. The Talbot interference is based on a transmitted light. The transmitted light is transmitted through the light transmissive portions by applying a light to the mask pattern for interference. The part of interference light is produced by the Talbot interference by means of a mask pattern for light blocking and applying another part of the interference light transmitted through the mask pattern for light blocking to an exposure object member.
Public/Granted literature
- US20150055113A1 PATTERN FORMATION METHOD, MASK FOR EXPOSURE, AND EXPOSURE APPARATUS Public/Granted day:2015-02-26
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