Invention Grant
US09329496B2 Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium 有权
曝光装置,曝光方法,制造装置,程序和存储介质的方法

Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium
Abstract:
An exposure apparatus exposing a substrate with exposure light through liquid, including: an optical member having an emitting surface from which exposure light is emitted; a substrate holding apparatus that includes: a first holding portion holding a lower surface of substrate so that lower surface of substrate can be released, and a first member that defines an opening where substrate can be arranged, and that has an upper surface which is arranged at a vicinity of an upper surface of the substrate in a state which the substrate is held by the first holding portion; and a porous member of which at least a part is arranged at a gap between the substrate and the first member, and which has an upper surface liquid-repellent with respect to the liquid, wherein at least a part of the liquid which flows into the gap is recovered through the porous member.
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