Invention Grant
US09329496B2 Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium
有权
曝光装置,曝光方法,制造装置,程序和存储介质的方法
- Patent Title: Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium
- Patent Title (中): 曝光装置,曝光方法,制造装置,程序和存储介质的方法
-
Application No.: US13552140Application Date: 2012-07-18
-
Publication No.: US09329496B2Publication Date: 2016-05-03
- Inventor: Shinji Sato
- Applicant: Shinji Sato
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JPP2011-159999 20110721; JPP2012-116713 20120522
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/52 ; G03B27/58 ; H02K41/02 ; G03F7/20 ; H01L21/68

Abstract:
An exposure apparatus exposing a substrate with exposure light through liquid, including: an optical member having an emitting surface from which exposure light is emitted; a substrate holding apparatus that includes: a first holding portion holding a lower surface of substrate so that lower surface of substrate can be released, and a first member that defines an opening where substrate can be arranged, and that has an upper surface which is arranged at a vicinity of an upper surface of the substrate in a state which the substrate is held by the first holding portion; and a porous member of which at least a part is arranged at a gap between the substrate and the first member, and which has an upper surface liquid-repellent with respect to the liquid, wherein at least a part of the liquid which flows into the gap is recovered through the porous member.
Public/Granted literature
- US20130057838A1 EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD OF MANUFACTURING DEVICE, PROGRAM, AND STORAGE MEDIUM Public/Granted day:2013-03-07
Information query