Invention Grant
- Patent Title: Polishing composition for nickel-phosphorous memory disks
- Patent Title (中): 镍磷记忆盘抛光组合物
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Application No.: US12455631Application Date: 2009-06-04
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Publication No.: US09330703B2Publication Date: 2016-05-03
- Inventor: Selvaraj Palanisamy Chinnathambi , Haresh Siriwardane
- Applicant: Selvaraj Palanisamy Chinnathambi , Haresh Siriwardane
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas Omholt; Arlene Hornilla
- Main IPC: G11B5/84
- IPC: G11B5/84 ; C23F1/00 ; C09G1/02 ; C09K3/14 ; C23F1/14 ; G11B23/50
Abstract:
The invention provides a chemical-mechanical polishing composition comprising alpha alumina, fumed alumina, silica, an oxidizing agent that oxidizes nickel-phosphorous, a complexing agent, and water. The invention also provides a method of chemically-mechanically polishing a substrate comprising contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.
Public/Granted literature
- US20100308016A1 Polishing composition for nickel-phosphorous memory disks Public/Granted day:2010-12-09
Information query
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